Ideal as a dual-use (lithography and via-generation) system
The Anvik HexScanTM 2150 SXE patterning system represents a revolutionary advance in large-format lithography and via-generation systems. It offers the unique combination of high-resolution projection imaging and large-area substrate handling, making it the ideal patterning tool for high-volume, cost-effective production of microelecronic modules and printed circuits. With its excimer laser source emitting 50 watts of UV radiation, this low-cost system serves both as a volume-production resist lithography tool, and as a high-speed, batch via-generation system for dielectric layers.
Large-format substrate handling
* Designed for projection patterning of substrate sizes of 460 x 610 mm (18 x 24 inches) and larger (1100 x 1250 mm); scalable to 1500 x 1800 mm.
* Capable of handling substrates of a wide range of thicknesses
* Fully automated handling and mask-substrate alignment minimizes overhead time
High resolution
* Resolution of 15 microns (0.6 mil) (lines, spaces, holes)
* Patented seamless scanning technology (HexScanTM) delivers lens resolution over entire panel
* High resolution enables excellent line-edge definition and via profiles
Very high exposure throughput
Exposure throughputs as high as 180 panels/hr (12 x 12 inch panels), made possible by
* Seamless scanning with hexagonal illumination
* High-power excimer laser illumination system
* High-speed, high-precision scanning stage
Versatility
* Delivers very high throughput for lithography in a wide range of photoresist materials
* Capable of high-speed, batch via generation in a variety of polymeric dielectrics
* Available with Anvik's patented Variable-Area Substrate Tiling (VASTTM) technology
Modularity and upgradability
* Modular design enables user to define optimum system configuration
* Customer may specify resolution, substrate size parameters and exposure wavelength
* Upgradability of key subsystems extends system life over multiple product generations
HexScanTM 2150 SXE Specifications
| Imaging Technique |
Seamless scanning projection |
| Resolution |
15 microns (0.6 mil) |
| Projection System |
1:1 magnification refractive lens |
| Depth of Focus |
1.3 mm (50 mils) |
| Substrate Size |
Up to 1100 x 1250 mm (44 x 50 in), with or without tiling |
| Illumination Source |
XeF excimer laser (other sources optional) |
| Exposure Wavelength |
351 nm (other wavelengths optional) |
| Overlay Precision |
3 microns |
| Alignment System |
Automatic |
| Panel and Mask Handling |
Automatic |
| Exposure Throughput |
>160 panels/hr (12 x 12 in panels) |
|
|
Lithography
| Electron
beam lithography |
Printmaking
: Lithograpy | Large
area lithography |
Selecting
the right paper | Applications
Of Litho Printing | Lithographic
Printing Process
|
